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Titanium Aluminum Alloy Cathode Magnetron Sputtering Target图1Titanium Aluminum Alloy Cathode Magnetron Sputtering Target图2Titanium Aluminum Alloy Cathode Magnetron Sputtering Target图3Titanium Aluminum Alloy Cathode Magnetron Sputtering Target图4Titanium Aluminum Alloy Cathode Magnetron Sputtering Target图5Titanium Aluminum Alloy Cathode Magnetron Sputtering Target图6

Titanium Aluminum Alloy Cathode Magnetron Sputtering Target

Price Negotiable
Min Order 1 Piece  
Shipping from Guangdong, China
Quantity
-+
Product details
TiAl alloy
Alloy Target
Round
7 Days
Gr1, Gr2, Gr3, Gr4, Gr5 etc.
szzzyj
Wooden Case
According drawing
China
Product Description
Product Description

Products attributes of Ti sputtering target

Item Name

High purity titanium (Ti) target

Purity

99.9%~99.999%,Grade1 to Grade 5

Shape

Square/Round, According to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Solar Photovoltaic Application.

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.

 

Quality Standard (99.999% Ti)

Element

Value(<ppm)

Element

Value (<ppm)

Element

Value(<ppm)

Ag

0.05

Al

0.11

As

0.03

Au

0.05

B

0.01

Ba

0.005

Be

0.005

Bi

0.01

Br

0.05

Ca

0.2

Cd

0.05

Ce

0.005

Hg

0.1

Fe

3.2

Ga

0.05

I

0.01

Ge

0.05

Hf

0.01

 

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Zhongzheng Yejin Technology Co., Ltd.

Audited Supplier9 Years
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